| 摘要 |
PROBLEM TO BE SOLVED: To provide a solvent treatment apparatus including a constitution for preventing a gas to be objective for treatment from flowing out to a vent duct for desorption, preventing a gas for desorption from flowing out to a suction opening for adsorption, and preventing the gas for desorption from flowing out to a vent duct for adsorption.SOLUTION: In a controlling apparatus of a solvent treatment apparatus, when the inner pressure of a suction opening 14 for adsorption is P1, the inner pressure of a vent duct 15 for adsorption is P2, the inner pressure of the supplying duct 16 for desorption is P3, and the inner pressure of the vent duct 17 for desorption is P4, by controlling the pressures from the pressures P1 to P4 of the inner pressures of the absorption means and the inner pressures of the desorption means, the gas G1 to be objective for treatment is prevented from flowing out to the vent duct 17 for desorption, the gas G2 for desorption is prevented from flowing out to the suction opening 14 for adsorption, and it is prevented from flowing out to the vent duct 15 for adsorption. |
