| 摘要 |
The present invention relates to a substrate cleaning brush and a substrate cleaning device including the same and provides the substrate cleaning brush and the substrate cleaning device including the same capable of increasing a cleaning area by sufficiently securing a contact area while a cleaning protrusion of a cleaning brush is in contact with a substrate, preventing secondary contamination by pushing foreign substances separated from the surface of the substrate in a spiral direction and discharging the foreign substances with the rotated cleaning brush without preparing an additional facility, and cleaning the whole surface of the substrate more thoroughly by generally being in contact with the surface of the substrate with the cleaning protrusion. The substrate cleaning device includes the substrate cleaning brush, a rotary axis, and a driving motor. |
