FORMING LAYERS OF MATERIALS OVER SMALL REGIONS BY SELECTIVE CHEMICAL REACTION INCLUDING LIMITING ENCROACHMENT OF THE LAYERS OVER ADJACENT REGIONS
摘要
A method of an aspect includes forming a first thicker layer of a first material over a first region having a first surface material by separately forming each of a first plurality of thinner layers by selective chemical reaction. The method also includes limiting encroachment of each of the first plurality of thinner layers over a second region that is adjacent to the first region. A second thicker layer of a second material is formed over the second region having a second surface material that is different than the first surface material.
申请公布号
EP3050084(A1)
申请公布日期
2016.08.03
申请号
EP20130894765
申请日期
2013.09.27
申请人
INTEL CORPORATION
发明人
BRISTOL, ROBERT L.;BLACKWELL, JAMES M.;CLENDENNING, SCOTT B.;GSTREIN, FLORIAN;HAN, EUNGNAK;KLOSTER, GRANT M.;ROBERTS, JEANETTE M.;ROMERO, PATRICIO E.;HOURANI, RAMI