发明名称 微小亀裂耐性の向上した積層品及びその製造方法
摘要 The invention relates to a multilayer article which includes a substrate, a first layer comprising a partial condensate of a diorganodiorganooxysilane having the formula R2Si(OR')2 or an organotriorganooxysilane having the formula RSi(OR')3, or both, where R is independently selected from the group consisting of alkyl groups containing about 1-3 carbon atoms, aromatic groups containing about 6-13 carbon atoms, the vinyl radical, the 3,3,3-trifluoropropyl radical, the gamma-glycidoxypropyl radical and the gamma-methacryloxypropyl radical, and R' is independently selected from the group consisting of alkyl groups containing about 1-8 carbon atoms, aromatic groups containing about 6-20 carbon atoms, and hydrogen; and a second layer deposited on the first layer, the second layer comprising an organosilicon material which has been polymerized and oxidized in a plasma, the second layer containing silicon, oxygen, carbon, and hydrogen.
申请公布号 JP5965225(B2) 申请公布日期 2016.08.03
申请号 JP20120149041 申请日期 2012.07.03
申请人 サビック グローバル テクノロジーズ, ベスローテン フェンノートシャップSABIC Global Technologies,B.V. 发明人 ガスワース,スティーブン・マーク;オルソン,ダニエル・ロバート;カツァムベリス,ディミトリス
分类号 B05D3/04;B32B27/00;B05D7/00;B05D7/24;B32B27/30;C08J7/04 主分类号 B05D3/04
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