| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a fine structure capable of forming a nano-level structure reforming part etched at a stable etching speed when the structure reforming part is formed by collecting and emitting a laser beam having a picosecond order or shorter of pulse width to a substrate and by scanning a focus of the laser beam.SOLUTION: A method for forming a fine structure includes: a first step of forming a structure reforming part 103 within a base body 101 by collecting and emitting a laser beam 102 which is emitted from a light source and has a picosecond order or shorter of pulse width to inside of the base body 101 and by scanning a focus 102f; and a second step of forming a fine hole within the base body 101 by etching the structure reforming part 103. The laser beam 102 used in the first step is converted to a circularly polarized laser beam, and intensity at the focus 102f is larger than intensity required for forming the structure reforming part 103 when a linearly polarized laser beam is emitted to the base body 101. |
