发明名称 電子ビーム描画方法および描画装置
摘要 PROBLEM TO BE SOLVED: To solve the problem that a multibeam array is not a perfect square matrix, it is necessary to control an ON/OFF signal of each beam in independent timing at a fixed scan speed, the quantity of control data is huge, sharpness at an edge of a pattern is different between a scanning direction and a non-scanning direction, and it is difficult to draw a pattern with a high accuracy.SOLUTION: A square grid matrix beam group is formed within a two-dimensional plane of an interval that is an integer multiple of a beam size, from electron beams from an electron gun 1. An individual blanker 13 of a mesh of a device to be drawn is turned ON/OFF in accordance with a bitmap signal and a desired beam is obtained. Furthermore, beams are deflected to required positions by deflection devices 17, 18 and after a beam state becomes stationary, general blankers 16 are opened for irradiation with beams, thereby obtaining a high-accuracy and high-speed drawing pattern.
申请公布号 JP5963139(B2) 申请公布日期 2016.08.03
申请号 JP20120220491 申请日期 2012.10.02
申请人 株式会社PARAM 发明人 安田 洋
分类号 H01L21/027;H01J37/305 主分类号 H01L21/027
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