发明名称 液処理装置及び液処理方法
摘要 PROBLEM TO BE SOLVED: To efficiently prevent an increase in particles contained in a process liquid without wastefully consuming the process liquid.SOLUTION: A liquid processing apparatus comprises: a supply pipeline 51 connecting between a resist container 60 and a process liquid supply nozzle 7; a filter device 52a interposed in the supply pipeline; a pump P interposed in the supply pipeline on a secondary side of the filter device; a circulation pipeline 55 between a secondary side of the pump and a primary side of the filter device; a supply control valve 57 interposed on a secondary side of the pump; an on-off valve V35 provided on a discharge side of the pump, and capable of selectively supplying a process liquid to the circulation pipeline; a switching valve V6 provided, on a primary side of the filter device, in the supply pipeline on a secondary side of a connection between the circulation pipeline and the supply pipeline; and a controller 200 for controlling the pump, the supply control valve, the on-off valve and the switching valve. While the supply control valve, the on-off valve and the switching valve are closed, driving of drive means of the pump allows a pump part to have negative pressure to thereby make fine bubbles existing in the process liquid apparent.
申请公布号 JP5956975(B2) 申请公布日期 2016.07.27
申请号 JP20130259068 申请日期 2013.12.16
申请人 東京エレクトロン株式会社 发明人 吉原 孝介;一野 克憲;古庄 智伸;佐々 卓志;土屋 勝裕;寺下 裕一;竹口 博史
分类号 H01L21/027;H01L21/304 主分类号 H01L21/027
代理机构 代理人
主权项
地址