| 摘要 |
The invention relates to a substrate processing device and a substrate processing method. The substrate processing device of an embodiment comprises a tray used to load a substrate, a moving-in unit which moves in the tray of the substrate before plasma treatment, a fixture used to configure the tray on the fixture, a loading port used to make the fixture standby, a plasma treating unit which executes the plasma treatment on the substrate after the tray and the fixture are moved in, and a moving-out unit which moves out the tray of the substrate which goes through the plasma treatment. |
