发明名称 METHOD AND ZONE FOR SEALING BETWEEN TWO MICROSTRUCTURE SUBSTRATES
摘要 The invention concerns a sealing zone between two microstructure substrates. Said sealing zone comprises at least the following parts: on a first wafer level (20), a lower edging (22A) made of an adhesive material capable of causing the first substrate (20) to adhere to a sealing material, said sealing material being adapted to spontaneously diffuse jointly with the material of the second wafer level (30); on said lower edging (22A), a layer of said sealing material; and on said layer of sealing material, a protuberance (36) formed on said second wafer level (30) containing a certain amount of sealing material. The invention is applicable to microstructures comprising vacuum-operated components.
申请公布号 EP1467947(B1) 申请公布日期 2016.07.27
申请号 EP20020806329 申请日期 2002.12.17
申请人 COMMISSARIAT À L'ÉNERGIE ATOMIQUE ET AUX ÉNERGIESALTERNATIVES 发明人 DIEM, BERNARD;CAPLET, STÉPHANE;DELAYE, MARIE-THÉRÈSE
分类号 B81B7/00;B81C3/00 主分类号 B81B7/00
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