发明名称 MANUFACTURE METHOD OF THE ENTILATE GAS TUBE FOR SEMICONDUCTOR EQUIPMENT
摘要 The present invention relates to a method for manufacturing an exhaust gas pipe for semiconductor manufacturing equipment and, more specifically, to a method for manufacturing an exhaust gas pipe for semiconductor manufacturing equipment, which prevents corrosion inside a pipe due to toxic and corrosive exhaust gas generated during semiconductor manufacturing processes, prevents attachment of powder by-products, and uses fluorine resin powder instead of an existing fluorine resin liquid, simplifying manufacturing processes, and obtaining an excellent film coating feature.
申请公布号 KR101643158(B1) 申请公布日期 2016.07.27
申请号 KR20160040211 申请日期 2016.04.01
申请人 WOO JIN I & S CO., LTD. 发明人 KIM, JUNG JIN
分类号 H01L21/02;F16L9/02;F16L58/02;H01L21/60;H01L21/67 主分类号 H01L21/02
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