| 摘要 |
The present invention relates to a novel type hard mask polymer which is useful for a semiconductor lithographic process and has anti-reflective characteristics, and to a composition containing the same. The spirobifluorene-based polymer and the composition according to the present invention provide very excellent optical characteristics, mechanical characteristics, and hard mask etching selection ratio characteristic, and provide a coating film having excellent solubility characteristics and using a spin-on coating method. |
