| 摘要 |
PROBLEM TO BE SOLVED: To add properly an additional element to a thin film, while depositing the highly homogeneous thin film by an ion plating method using a plasma gun.SOLUTION: At least a part of the inner peripheral surface of a cylindrical anode electrode 12 of a plasma gun 3 for discharging plasma for assisting film deposition into a vacuum vessel 2 for performing film deposition therein is constituted of a dopant member 12b containing an additional element to be added to a thin film to be deposited. The dopant member 12b is sputtered by plasma generated inside the anode electrode 12, and the additional element is discharged into the vacuum vessel 2 by sputtering. |
