发明名称 窒化物半導体構造、窒化物半導体発光素子、窒化物半導体トランジスタ素子、窒化物半導体構造の製造方法および窒化物半導体素子の製造方法
摘要 A nitride semiconductor structure in which a first nitride semiconductor underlying layer is provided on a substrate having a recess portion and a projection portion provided between the recess portions at a surface thereof, the first nitride semiconductor underlying layer has at least 6 first oblique facet planes surrounding the projection portion on an outer side of the projection portion, and a second nitride semiconductor underlying layer buries the first oblique facet planes, a nitride semiconductor light emitting element, a nitride semiconductor transistor element, a method of manufacturing a nitride semiconductor structure, and a method of manufacturing a nitride semiconductor element are provided.
申请公布号 JP5955226(B2) 申请公布日期 2016.07.20
申请号 JP20120550884 申请日期 2011.12.21
申请人 シャープ株式会社 发明人 荒木 正浩;吉田 慎也;瀧口 治久;小河 淳;木下 多賀雄;村田 徹;舩木 毅;布袋田 暢行
分类号 H01L33/22;H01L21/205;H01L21/338;H01L29/778;H01L29/812;H01L33/34;H01L33/52;H01L33/62 主分类号 H01L33/22
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