| 摘要 |
PROBLEM TO BE SOLVED: To provide an application device and an application method capable of obtaining a uniform and high-quality application film having no unevenness by applying liquid while accurately adjusting a clearance on the basis of a clearance value measured during the application.SOLUTION: In a clearance measuring method for measuring a clearance C between a discharge port surface 2g including an application liquid discharge port of an application unit 2s and a surface 9a to be applied of a member 9 to be applied arranged oppositely to the discharge port, a real image of an end part of the discharge port surface 2g and a reflection image 2ji of an end part 2j of the discharge port surface 2g on the surface 9a to be applied of the member 9 to be applied are captured, and the clearance C between the discharge port surface 2g of the application unit 2s and the surface 9a to be applied of the member 9 to be applied is calculated on the basis of a length between the captured real image of the end part 2j of the discharge port surface 2g and the reflection image of the end part 2j of the discharge port surface 2g. |
