发明名称 EVALUATION DEVICE FOR OXIDE SEMICONDUCTOR THIN FILM
摘要 Provided is an evaluation device that can conveniently measure and predict/estimate the mobility and stress resistance of an oxide semiconductor thin film by means of a single, non-contact-type and accurate device. The evaluation device of the present invention comprises, with regard to a measurement region of a sample, a first excitation-light radiating means that radiates first excitation light and generates electron-hole pairs, an electromagnetic wave radiating means that radiates electromagnetic waves, a reflected-electromagnetic-wave intensity detecting means that detects the intensity of reflected electromagnetic waves, a second excitation-light radiating means that radiates second excitation light toward the sample and generates photoluminescent light, an emitted-light intensity measuring means that measures the emitted-light intensity of the photolumuniscent light, and an evaluation means that evaluates mobility and stress resistance. Additionally, the first excitation-light radiating means and the second excitation-light radiating means are the same or different excitation-light radiating means.
申请公布号 EP3046141(A1) 申请公布日期 2016.07.20
申请号 EP20140844691 申请日期 2014.09.10
申请人 KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD.) 发明人 HAYASHI, Kazushi;KISHI, Tomoya
分类号 H01L21/66;G01N21/64;G01N22/00 主分类号 H01L21/66
代理机构 代理人
主权项
地址