| 摘要 |
The invention pertains to an apparatus for producing silicon oxide, provided with: a reaction chamber for producing silicon oxide gas by reacting a mixed raw material powder containing silicon dioxide powder; a raw material supply mechanism for supplying the mixed raw material powder to the inside of this reaction chamber; two or more substrates for depositing the silicon oxide gas as solid silicon oxide on the surfaces thereof; a deposition chamber for depositing solid silicon oxide on the substrates; a transport pipe for transporting the silicon oxide gas from the reaction chamber to the deposition chamber; a recovery chamber; and a preparation chamber for arranging the substrates on which the solid silicon oxide is deposited; the deposition chamber and the recovery chamber being connected via a gate valve on the recovery chamber side, and the deposition chamber and the preparation chamber being connected via a gate valve on the preparation chamber side. The invention makes it possible to efficiently and stably produce high-purity silicon oxide continuously over an extended period of time. |
