发明名称 化合物半導体装置の製造方法、基板評価装置及び基板評価方法
摘要 PROBLEM TO BE SOLVED: To provide a highly reliable compound semiconductor device which can preliminarily find an occurrence of defects in a compound semiconductor layer and prevent the occurrence of defects by performing non-contact screening in a state of a substrate before forming the compound semiconductor layer thereby to improve yield and reduce manufacturing cost.SOLUTION: A compound semiconductor device manufacturing method comprises: irradiating a substrate surface of a SiC substrate 1 with polarized laser beams by a polarized laser 12 to detect light-emission from the SiC substrate 1 by a detection part 13; obtaining an in-plane distribution of a light-emission intensity of the SiC substrate 1 by a display part 14 to evaluate a nitrogen mixed amount in the SiC substrate 1; and subsequently, forming a compound semiconductor laminated structure 2 on the SiC substrate 1.
申请公布号 JP5953712(B2) 申请公布日期 2016.07.20
申请号 JP20110255318 申请日期 2011.11.22
申请人 富士通株式会社 发明人 吉川 俊英;山田 敦史;清水 さなえ;今西 健治
分类号 H01L21/66;G01N21/64 主分类号 H01L21/66
代理机构 代理人
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