| 摘要 |
PROBLEM TO BE SOLVED: To provide a photoresist resin composition having good sensitivity and resolution, high film residual property and no inferior properties compared to general-purpose resin compositions.SOLUTION: The photoresist resin composition comprises: a novolac type phenolic resin obtained by reacting phenols including metacresol, paracresol and 2,3,6-trimethylphenol with formaldehyde in the presence of an acid catalyst; a naphthoquinonediazide derivative; and a solvent. The phenols preferably include 2,3,5-trimethylphenol. |
