| 摘要 |
A containment for one or more substrates has an enclosure that defines a contained volumetric area and included therein is a block or plate getter unit that has an enhanced performance provided by increased surface area formed on the plate or block by a series of grooves or other repeating surface structure pattern. Such patterning provides increased surface area on the block or plate and thus increased exposure of active elements to the contained volumetric region. In an embodiment, structure on one side of the block or plate has mirror image surface or a complementary surface on the opposing side. With such a structure, rigidity of the block or plate is preserved, weight is minimized, and exposed surface area is maximized. The enclosure may have specific pockets or may utilize a conventional substrate slot for the block or plate getter. The plate or block getter may be configured to fit within a conventional slot or a dedicated pocket in a wafer container or other substrate container. |
