发明名称 レジストの現像方法、レジストパターンの形成方法およびモールドの製造方法並びにそれらに使用される現像液
摘要 A method for developing a non chemically amplified resist employs a developing fluid having a carboxylic acid compound, which is a carboxylic acid ester having branched chain alkyl groups and a total carbon number of 8 or greater, as a main component. It is particularly preferable for the carboxylic acid compound to be at least one of isobutyl butyrate, butyl isobutyrate, isobutyl isobutyrate, isoamyl isobutyrate, and 2-methylbutyrate 2-methylbutyl. It is also preferable for the non chemically amplified resist to be a resist having a copolymer of an α-chloroacrylate ester compound and an α-methylstyrene compound as a main component.
申请公布号 JP5952613(B2) 申请公布日期 2016.07.13
申请号 JP20120078659 申请日期 2012.03.30
申请人 富士フイルム株式会社 发明人 高野 行央;土橋 徹;関 友和
分类号 G03F7/32;B29C33/38;G03F7/039 主分类号 G03F7/32
代理机构 代理人
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