发明名称 |
RADIATION SOURCE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD |
摘要 |
A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of material highly reflective of non-EUV secondary radiation located on a radiation incident side of the body. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of high emissivity material on an end of the body. |
申请公布号 |
EP2310912(B1) |
申请公布日期 |
2016.07.13 |
申请号 |
EP20090777515 |
申请日期 |
2009.07.29 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
YAKUNIN, ANDREY, MIKHAILOVICH;BANINE, VADIM, YEVGENYEVICH;MOORS, JOHANNES, HUBERTUS, JOSEPHINA;SJAMENOK, LEONID, AIZIKOVITCH |
分类号 |
G03F7/20;B82Y10/00;G02B5/20;G21K1/06;G21K1/10 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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