| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a microstructure that includes a step of exposing a photoresist by laser scanning and a step of developing the photoresist and that, even if a height of protrusions is comparatively great, for example, 20 μm or more, enables a desired pattern to be stably obtained.SOLUTION: A manufacturing method of a microstructure having a rugged pattern on a surface thereof includes: an application step of applying a positive photoresist onto a substrate; an exposing step of subjecting the photoresist to scanning irradiation with a laser beam and exposing the photoresist; and a developing step of developing the photoresist. In the exposing step, a plurality of times of exposure are performed for the same place using the same pattern. |
