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发明名称
Thin film transistor and manufacturing method of the same
摘要
박막트랜지스터 및 그 제조방법이 개시된다. 개시된 박막트랜지스터는 게이트; 게이트 절연막; 제1산화물반도체층 및 제2산화물반도체층을 포함하는 채널층; 상기 채널층의 양측에 각각 접촉 형성된 소스 및 드레인;을 포함하며, 상기 제1산화물반도체층의 결정립 크기는 상기 제2산화물반도체층의 결정립 크기에 비해 상대적으로 크다.
申请公布号
KR101638978(B1)
申请公布日期
2016.07.13
申请号
KR20090067826
申请日期
2009.07.24
申请人
삼성전자주식회사;성균관대학교산학협력단
发明人
손경석;권장연;김형섭;이후정;문미란;박경
分类号
H01L29/786
主分类号
H01L29/786
代理机构
代理人
主权项
地址
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