| 摘要 |
A thin film deposition apparatus used to produce large substrates on a mass scale and improve manufacturing yield. The thin film deposition apparatus comprises: a deposition source arranged to discharge a deposition material; a first nozzle disposed downstream of the deposition source and including a plurality of first openings arranged in a first direction; a second nozzle disposed downstream of the first nozzle and including a plurality of second openings arranged in the first direction; a barrier wall assembly including a plurality of barrier walls arranged in the first direction between the first nozzle and the second nozzle so as to partition a space between the first nozzle and the second nozzle into a plurality of sub-deposition spaces. |
