发明名称 Ga含有酸化物層成長用β−Ga2O3系単結晶基板
摘要 Provided are: a crystal laminate structure, in which crystals can be epitaxially grown on a ²-Ga 2 O 3 -based substrate with high efficiency to produce a high-quality ²-Ga 2 O 3 -based crystal film on the substrate; and a method for producing the crystal laminate structure. Provided is a crystal laminate structure (2) comprising: a ²-Ga 2 O 3 -based substrate (1), of which the major face (10) is a face that is rotated by 50 to 90° inclusive with respect to face (100); and a ²-Ga 2 O 3 -based crystal film (2) which is formed by the epitaxial crystal growth on the major face (10) of the ²-Ga 2 O 3 -based substrate (1).
申请公布号 JP5952360(B2) 申请公布日期 2016.07.13
申请号 JP20140179414 申请日期 2014.09.03
申请人 株式会社タムラ製作所 发明人 佐々木 公平
分类号 C30B29/16 主分类号 C30B29/16
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