发明名称 |
METHOD FOR FORMING DENSE SILICIC FILM |
摘要 |
The present invention provides a dense silicic film and a producing method thereof. This method comprises coating a composition for coating film, which comprises a polymer having a silazane bond on a substrate, on a substrate, irradiating with light having a maximal peak in the range of 160-179 nm wavelength, and then irradiating with light having 10-70 nm wavelength longer maximal peak wavelength than the light used in the previous irradiation. |
申请公布号 |
EP2907587(A4) |
申请公布日期 |
2016.07.06 |
申请号 |
EP20130845149 |
申请日期 |
2013.10.09 |
申请人 |
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À.R.L. |
发明人 |
OZAKI YUKI;SAKURAI TAKAAKI;KOBAYASHI MASAKAZU |
分类号 |
B05D7/24;B32B9/00;C01B21/068;C08J7/00;C08J7/04;C08J7/12;C09D183/16;C23C18/12;C23C18/14 |
主分类号 |
B05D7/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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