发明名称 METHOD FOR FORMING DENSE SILICIC FILM
摘要 The present invention provides a dense silicic film and a producing method thereof. This method comprises coating a composition for coating film, which comprises a polymer having a silazane bond on a substrate, on a substrate, irradiating with light having a maximal peak in the range of 160-179 nm wavelength, and then irradiating with light having 10-70 nm wavelength longer maximal peak wavelength than the light used in the previous irradiation.
申请公布号 EP2907587(A4) 申请公布日期 2016.07.06
申请号 EP20130845149 申请日期 2013.10.09
申请人 AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À.R.L. 发明人 OZAKI YUKI;SAKURAI TAKAAKI;KOBAYASHI MASAKAZU
分类号 B05D7/24;B32B9/00;C01B21/068;C08J7/00;C08J7/04;C08J7/12;C09D183/16;C23C18/12;C23C18/14 主分类号 B05D7/24
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