| 摘要 |
The present invention provides a method for controlling the plating amount in a melting and plating process to control the plating amount in response to a plating amount difference between the upper and lower surfaces of a steel plate. The method includes the steps of: (a) measuring an upper surface plating amount and calculating a first difference by subtracting the measured upper surface plating amount from the target upper surface plating amount; (b) measuring a lower surface plating amount and calculating a second difference by subtracting the measured lower surface plating amount from the target lower surface plating amount; (c) calculating an upper surface gap control amount based on the first difference and a lower surface gap control amount based on the second difference; (d) calculating a determination reference value based on the upper and lower surface gap control amounts; (e) determining whether the determination reference value is greater than a lower gap limit value; and (f) calculating the gap control amount when the determination reference value is greater than the lower gap limit and calculating a pressure control amount when the determination reference value is less than the lower gap limit. |
