发明名称 HEMT-COMPATIBLE LATERAL RECTIFIER STRUCTURE
摘要 The disclosure relates to a high electron mobility transistor-compatible power lateral field-effect rectifier (L-FER) device. In embodiments, a rectifier device has an electron supply layer located on a layer of a semiconductor material at a position between anode and cathode terminals. A layer of doped III-N semiconductor material is arranged on the electron supply layer. A passivation layer is located on the electron supply layer and the layer of the doped III-N semiconductor material. A gate structure is arranged on the layer of the doped III-N semiconductor material and the passivation layer. The layer of the doped III-N semiconductor material controls threshold voltage of the rectifier device. The passivation layer alleviates current reduction caused by high-temperature reverse bias (HTRB) stress. Therefore, reliability of an L-FER device can be improved.
申请公布号 KR20160079617(A) 申请公布日期 2016.07.06
申请号 KR20150093469 申请日期 2015.06.30
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 WONG KING YUEN;TSAI MING WEI;CHIU HAN CHIN
分类号 H01L29/778;H01L29/417;H01L29/423 主分类号 H01L29/778
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