发明名称 |
HEMT-COMPATIBLE LATERAL RECTIFIER STRUCTURE |
摘要 |
The disclosure relates to a high electron mobility transistor-compatible power lateral field-effect rectifier (L-FER) device. In embodiments, a rectifier device has an electron supply layer located on a layer of a semiconductor material at a position between anode and cathode terminals. A layer of doped III-N semiconductor material is arranged on the electron supply layer. A passivation layer is located on the electron supply layer and the layer of the doped III-N semiconductor material. A gate structure is arranged on the layer of the doped III-N semiconductor material and the passivation layer. The layer of the doped III-N semiconductor material controls threshold voltage of the rectifier device. The passivation layer alleviates current reduction caused by high-temperature reverse bias (HTRB) stress. Therefore, reliability of an L-FER device can be improved. |
申请公布号 |
KR20160079617(A) |
申请公布日期 |
2016.07.06 |
申请号 |
KR20150093469 |
申请日期 |
2015.06.30 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
WONG KING YUEN;TSAI MING WEI;CHIU HAN CHIN |
分类号 |
H01L29/778;H01L29/417;H01L29/423 |
主分类号 |
H01L29/778 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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