| 摘要 |
The purpose of the present invention is to provide a vacuum deposition device capable of increasing a ratio of a planarization part with a membrane pattern, preventing the pattern from being blurred, and obtaining a deposition film of which film thickness distribution is uniform. A plurality of evaporation hole units (2) along a longitudinal direction of an evaporation source (1) are formed in the evaporation source (1). A substrate (3) arranged in the evaporation source (1) and at a position where the substrate faces the evaporation source (1) relatively moves in a direction which is perpendicular to the longitudinal direction of the evaporation source (1) and jets a membrane material from the evaporation hole units (2). Therefore, the vacuum deposition device forms the deposition film on the substrate (3). At least a pair of outer evaporation hole units (2) formed on the outer side of the evaporation hole units (2) has an opening end area which is tilted towards a longitudinal direction outer side of the evaporation source (1). At least one among inner evaporation hole units (2) located inside the outer evaporation hole units (2) has an opening end area which is tilted to a longitudinal-direction center side of the evaporation source (1). |
