发明名称 VAPORIZATION SYSTEM
摘要 The present invention relates to a vaporization system in which a flow passage for mounting a flow rate control device is not formed in a vaporizer and a pipe in the vaporization system is unnecessary to miniaturize the vaporization system. The vaporization system comprises: a vaporizer (21) which vaporizes a liquid material; a supply amount control device (22) which controls the amount of liquid material supplied to the vaporizer (21); and a manifold block (B) which is provided with flow passages therein and has a device mounting face (B1x) for mounting the vaporizer (21) and the supply amount control device (22), wherein the vaporizer (21) and the supply amount control device (22) are mounted on the device mounting face (B1x), thereby being connected through the flow passages (R1 to R4).
申请公布号 KR20160076430(A) 申请公布日期 2016.06.30
申请号 KR20150165408 申请日期 2015.11.25
申请人 HORIBA STEC, CO., LTD. 发明人 TAGUCHI AKIHIRO;HAMADA MASASHI;YADA HIDETAKA
分类号 H01L21/02;H01L21/205;H01L21/324;H01L21/54 主分类号 H01L21/02
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