RADIO-FREQUENCY SPUTTERING SYSTEM WITH ROTARY TARGET FOR FABRICATING SOLAR CELLS

摘要

One embodiment of the present invention provides a sputtering system for large-scale fabrication of solar cells. The sputtering system includes a reaction chamber, a rotary target situated inside the reaction chamber which is capable of rotating about a longitudinal axis, and an RF power source coupled to at least one end of the rotary target to enable RF sputtering. The length of the rotary target is between 0.5 and 5 meters.

主权项

1. A sputtering system for large-scale fabrication of solar cells, comprising:
a reaction chamber; a rotary target positioned inside the reaction chamber, wherein the rotary target is configured to rotate about a longitudinal axis; an RF power source coupled to at least one end of the rotary target to enable RF sputtering, wherein a length of the rotary target is between 0.5 and 5 meters; and a capacitance tuner coupled to one end of the rotary target, wherein a capacitance of the capacitance tuner is configured to be tuned periodically.