发明名称 HETERO-JUNCTION SOLAR CELL AND MANUFACTURING METHOD THEREOF
摘要 A hetero junction solar cell includes a semiconductor substrate, a first n-type buffer layer, a second n-type buffer layer, a first amorphous silicon layer, a second amorphous silicon layer, a first TCO layer and a second TCO layer. The first n-type buffer layer and the second n-type buffer layer are formed respectively on a first surface and a second surface of the semiconductor substrate. The first amorphous silicon layer and the second amorphous silicon layer are formed respectively on the first n-type buffer layer and the second n-type buffer layer. The first TCO layer and the second TCO layer are formed respectively on the first amorphous silicon layer and the second amorphous silicon layer.
申请公布号 US2016190375(A1) 申请公布日期 2016.06.30
申请号 US201514672824 申请日期 2015.03.30
申请人 NEO SOLAR POWER CORP. 发明人 CHEN Peng
分类号 H01L31/0687;H01L31/068;H01L31/18;H01L31/0224;H01L31/0376;H01L31/20 主分类号 H01L31/0687
代理机构 代理人
主权项 1. A hetero-junction solar cell, comprising: a semiconductor substrate, having a first surface and a second surface opposing to the first surface, doped by a first type semiconductor; a first n-type buffer layer, formed on the first surface, further comprising: a first n-type amorphous silicon layer, formed on the first surface, doped by an n-type semiconductor with a dopant concentration ranged from 1×1014 to 1×1016 atoms/cm3; and a second n-type amorphous silicon layer, formed on the first n-type amorphous silicon layer; a second n-type buffer layer, formed on the second surface, further comprising: a third n-type amorphous silicon layer, formed on the second surface, doped by another n-type semiconductor with a dopant concentration ranged from 1×1014 to 1×1016 atoms/cm3; and a fourth n-type amorphous silicon layer, formed on the third n-type amorphous silicon layer; a first amorphous silicon layer, formed on the first n-type buffer layer, doped by a second type semiconductor; a second amorphous silicon layer, formed on the second n-type buffer layer, doped by the first type semiconductor; a first transparent conductive oxide layer, formed on the first amorphous silicon layer; and a second transparent conductive oxide layer, formed on the second amorphous silicon layer.
地址 Hsinchu TW