POLYETHER COMPOUND, PREPARATION METHOD AND PHOTORESIST COMPOSITION THEREOF

摘要

A polyether compound which is as shown in Formula (I), wherein R 1 is a polyether backbone of the polyether polyol; R 2 is hydrogen or C 1 ˆ¼C 5 alkyl; n is 3, 4 or 5. Furthermore, a photoresist composition comprising the polyether compound is disclosed. This photoresist composition is used to make the colored layer in a colored film substrate, in which the polymer film layer thus obtained has a small edge slope angle and is not prone to light leakage.