发明名称 WAFER TEMPORARY BONDING METHOD AND THIN WAFER MANUFACTURING METHOD
摘要 A method for temporarily bonding a wafer to a support via a temporary bonding arrangement is provided. The arrangement is a composite temporary adhesive layer consisting of a non-silicone thermoplastic resin layer (A) which is releasably bonded to the wafer, a thermosetting siloxane polymer layer (B) laid thereon, and a thermosetting siloxane-modified polymer layer (C) releasably bonded to the support. The method comprises the steps of providing a wafer laminate having a thermosetting silicone composition layer (B') formed on the resin layer (A) which has been formed on the wafer, providing a support laminate having a siloxane-containing composition layer (C') formed on the support, joining and heating layer (B') and layer (C') in vacuum for bonding and curing the layers together.
申请公布号 EP3038148(A1) 申请公布日期 2016.06.29
申请号 EP20150201534 申请日期 2015.12.21
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 YASUDA, Hiroyuki;SUGO, Michihiro;TAGAMI, Shohei;TANABE, Masahito
分类号 H01L21/683;B24B37/30;C09J7/02 主分类号 H01L21/683
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