| 发明名称 |
METHOD OF MANUFACTURING A PHOTO-FUNCTIONAL PATTERN STRUCTURE USING A PHOTO-INTERRUPTION MATERIAL |
| 摘要 |
A method for manufacturing a photo-functional pattern using a selective photo-interrupting material comprises the following steps: forming a photo-interrupting layer capable of interrupting non-visible light on a substrate; and forming a functional pattern having an uneven part to scatter or transmit visible light on the photo-interrupting layer. |
| 申请公布号 |
KR20160074781(A) |
申请公布日期 |
2016.06.29 |
| 申请号 |
KR20140183052 |
申请日期 |
2014.12.18 |
| 申请人 |
KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION |
发明人 |
LEE, HEON;KIM, YANG DOO |
| 分类号 |
H01L51/00 |
主分类号 |
H01L51/00 |
| 代理机构 |
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