发明名称 微小空洞形成方法
摘要 PROBLEM TO BE SOLVED: To provide a microvoid forming method by which a microvoid of high size precision in a stable shape can be obtained, and productivity is improved by preventing deterioration in quality of a circumference of the microvoid.SOLUTION: A microvoid forming method includes a laser processing step of forming a continuous modified region 11 which is not exposed to the outside in a workpiece 10 by irradiating the workpiece 10 with converged pulse laser light (a), a machining step of forming an exposed portion 11a in the modified region 11 by removing a part of the workpiece 10 by machining, and an etching step of forming a microvoid 12 by etching the modified region 11 away with the exposed portion 11a as a starting point.
申请公布号 JP5942558(B2) 申请公布日期 2016.06.29
申请号 JP20120091948 申请日期 2012.04.13
申请人 並木精密宝石株式会社 发明人 中谷 隆幸;柴田 大輔;畑澤 亮仁
分类号 C03B33/02;B23K26/40;B81B1/00;B81C1/00;C03C15/00;C03C19/00;C03C23/00 主分类号 C03B33/02
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