SUBSTRATE PROCESSING SYSTEM

摘要

The present invention relates to a substrate processing system with an improved structure to increase the substrate processing speed when a plurality of processes are continuously applied to a substrate. According to the present invention, the substrate processing system includes: a cassette module in which substrates before or after processing are stored; a waiting and transfer module which transfers the substrates stored in the cassette module; a wet processing module which cleans the surface of the substrates by supplying a cleaning agent onto the substrates; a load lock module which is connected to the wet processing module and converts the pressure into the atmospheric pressure or a vacuum state; a vacuum transfer module which is connected to the load lock module, in which the vacuum state is maintained, and which includes a substrate transfer robot; and a dry processing module which is connected to the vacuum transfer module and sprays etching gas to the substrates to etch a film formed on the substrates.