| 摘要 |
The present invention relates to an adhesive film which not only can provide protection against etching solutions but also does not leave adhesive traces on a body to be attached, and a surface protection film for chemical polishing using the same. The surface protection film for chemical polishing has an adhesive layer formed on a surface of a resin film substrate, wherein the resin film substrate has a thickness of 75 μm or more; the adhesive layer is prepared using an acrylic adhesive composition comprising a silane coupling agent and a cross-linker; and the surface protection film for chemical polishing is characterized in that, when the surface protection film, which is attached to a glass substrate while having the adhesive layer interposed therebetween, is immersed in 15% hydrofluoric acid aqueous solution at 27°C, there is no penetration of hydrofluoric acid for at least 150 seconds in an area of the attached surface of the glass surface which is at least 80 μm from the end of the attached surface of the surface protection film. |
