| 摘要 |
A workpiece having a coating, said coating comprising at least one TixSi1-xN layer, characterized in that x ≦0.85 and the TixSi1-xN layer contains nanocrystals, the nanocrystals present having an average grain size of not more than 15 nm and having a (200) texture. The invention also relates to a process for producing the aforementioned layer, characterized in that the layer is produced using a sputtering process, in which current densities of greater than 0.2 A/cm2 arise on the target surface of the sputtering target, and the target is a TixSi1-xN target, where x ≦0.85, An intermediate layer containing TiAlN or CrAlN is preferably provided between the TixSi1-xN layer and the substrate body of the workpiece. |
