RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resist composition which makes it possible to prepare a resist pattern with excellent line edge roughness.SOLUTION: The present invention provides a resist composition comprising a resin (A1) having an acid-labile group, a resin (A2) having a structural unit represented by formula (I) and an acid generator [where Ris a C1-C13 fluorinated saturated hydrocarbon group. Ais a single bond, a C1-C6 alkanediyl group or-A-X-(A-X)-(A)-. * is a bond to an oxygen atom].SELECTED DRAWING: None