发明名称 CLEANING LIQUID, METHOD OF CLEANING PIPELINE OF FILM FORMING APPARATUS BY COATING
摘要 PROBLEM TO BE SOLVED: To provide a cleaning liquid capable of cleaning and removing a siloxane gel deposited and adhered in a pipeline of a film forming apparatus by coating which is derived from a silicon-containing film material such as a silicon-containing resist under layer film material, and not generating precipitates and pipeline clog even if contacting with an organic material in the film forming apparatus by coating.SOLUTION: The cleaning liquid used when removing a siloxane gel adhered in a pipeline of a film forming apparatus by coating comprises an alcohol solution of tetraalkylammonium hydroxide or choline.SELECTED DRAWING: None
申请公布号 JP2016113485(A) 申请公布日期 2016.06.23
申请号 JP20140250913 申请日期 2014.12.11
申请人 SHIN ETSU CHEM CO LTD 发明人 OGIWARA TSUTOMU;BIYAJIMA YUSUKE;TANEDA YOSHINORI
分类号 C11D3/26;B05D3/10;B05D7/24;B08B3/08;B08B9/027;C09D9/00;G03F7/16 主分类号 C11D3/26
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