发明名称 |
CLEANING LIQUID, METHOD OF CLEANING PIPELINE OF FILM FORMING APPARATUS BY COATING |
摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning liquid capable of cleaning and removing a siloxane gel deposited and adhered in a pipeline of a film forming apparatus by coating which is derived from a silicon-containing film material such as a silicon-containing resist under layer film material, and not generating precipitates and pipeline clog even if contacting with an organic material in the film forming apparatus by coating.SOLUTION: The cleaning liquid used when removing a siloxane gel adhered in a pipeline of a film forming apparatus by coating comprises an alcohol solution of tetraalkylammonium hydroxide or choline.SELECTED DRAWING: None |
申请公布号 |
JP2016113485(A) |
申请公布日期 |
2016.06.23 |
申请号 |
JP20140250913 |
申请日期 |
2014.12.11 |
申请人 |
SHIN ETSU CHEM CO LTD |
发明人 |
OGIWARA TSUTOMU;BIYAJIMA YUSUKE;TANEDA YOSHINORI |
分类号 |
C11D3/26;B05D3/10;B05D7/24;B08B3/08;B08B9/027;C09D9/00;G03F7/16 |
主分类号 |
C11D3/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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