| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate liquid processing apparatus capable of space saving.SOLUTION: A substrate liquid processing apparatus according to one aspect of an embodiment includes a transport unit, a processing unit, a reservoir, and a feeding mechanism. A transport device for transporting a substrate is arranged in the transport unit. A liquid processing unit, contiguous to the transport unit in the horizontal direction and processing the wafer by using process liquid, is arranged in the processing unit. The reservoir reserves the process liquid. The feeding mechanism feeds the process liquid, reserved in the reservoir, to the liquid processing unit. The reservoir is arranged directly under the transport unit. The feeding mechanism is arranged directly under the processing unit.SELECTED DRAWING: Figure 5 |
