发明名称 PHOTO-CURABLE COMPOSITION FOR NANOIMPRINTING
摘要 PROBLEM TO BE SOLVED: To provide a photo-curable composition for nanoimprinting, excellent in dispersion stability, cured rapidly by photo-irradiation, and capable of forming a cured product which can detect easily fine pattern defects using an automatic optical substrate inspection device or the like.SOLUTION: A photo-curable composition for nanoimprinting of the present invention contains the following component (a), component (B) and component (C). Component (A): a cationic curable compound containing a compound represented by the following formula (a-1); Component (B): a metal complex of a heterocyclic compound having a tetraazaporphyrin skeleton; and Component (C): a photo cationic polymerization initiator.SELECTED DRAWING: None
申请公布号 JP2016115779(A) 申请公布日期 2016.06.23
申请号 JP20140252538 申请日期 2014.12.13
申请人 DAICEL CORP 发明人 YAMAMOTO TAKUYA;FUJIKAWA TAKESHI
分类号 H01L21/027;C08G59/24 主分类号 H01L21/027
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