发明名称 METHODS AND APPARATUS PROVIDING THERMAL ISOLATION OF PHOTONIC DEVICES
摘要 Described embodiments include photonic integrated circuits and systems with photonic devices, including thermal isolation regions for the photonic devices. Methods of fabricating such circuits and systems are also described.
申请公布号 US2016181495(A1) 申请公布日期 2016.06.23
申请号 US201615056845 申请日期 2016.02.29
申请人 Micron Technology, Inc. 发明人 Meade Roy;Sandhu Gurtej
分类号 H01L33/64;G02B6/12 主分类号 H01L33/64
代理机构 代理人
主权项 1. A method of forming an integrated circuit, the method comprising: providing a substrate; forming a temperature-sensitive photonic device above the substrate; forming a heating device above the substrate, wherein the heating device is configured to dissipate heat toward the photonic device; and forming a thermal isolation region in an area of the die neighboring the heating device, wherein the thermal isolation region reduces dissipation of heat from the heating device into the substrate in the direction of the isolation region.
地址 Boise ID US