PASSIVE DEVICE AND MANUFACTURING METHOD THEREOF

摘要

The present invention relates to a passive device and manufacturing method thereof. A capacitor according to the present invention includes: a capacitor thin film pattern formed on the upper surface of a substrate; a plurality of trenches formed by etching the substrate formed with the capacitor thin film pattern which defines the unit area of the capacitor; an insulation layer, which fills the trench, formed with capacitor interconnection holes for exposing the metal layers formed in the substrate and constituting the capacitor; and a plurality of capacitor electrode interconnection wires formed by filling the capacitor interconnection holes with a conductive material, wherein the lower surface of the substrate is being polished in a way that the insulation layer formed in the trenches is exposed.

主权项

1. A capacitor comprising:
a capacitor thin film pattern formed on one surface of a substrate; a plurality of trenches formed by etching the substrate formed with the capacitor thin film pattern so as to define a unit area of the capacitor; an insulation layer, which fills the trenches, formed with a plurality of capacitor interconnection holes for exposing metal layers formed in the substrate and constituting the capacitor; and a plurality of capacitor electrode interconnection wires formed by filling the capacitor interconnection holes with a conductive material, wherein the other surface of the substrate is polished in a way that the insulation layer formed in the trenches is exposed.