SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

摘要

The present invention relates to a salt for use in a resist composition capable of forming a resin pattern with excellent line edge roughness, and an acid generator and a resist composition comprising the same. The salt is represented by the following chemical formula I. In chemical formula I, each of R^1 and R^2 independently represents H, a hydroxyl or hydrocarbon group; each of m and n independently represents 1 or 2; Ar is a phenyl group that may have a substituent; each of Q^1 and Q^2 represents a fluorine atom or perflruorlkayl group; A^1 represents a single bond or a C1-C24 alkanediyl group; Y represents H or an alicyclic hydrocarbon group, wherein the alicyclic hydrocarbon group has one or more substituent, or one of more -CH_2- contained in the alicyclic group is substituted with -O-, -SO_2_ or -CO-.