发明名称 センサ、方法、および半導体センサ
摘要 Non-silicon based semiconductor devices are integrated into silicon fabrication processes by using aspect-ratio-trapping materials. Non-silicon light-sensing devices in a least a portion of a crystalline material can output electrons generated by light absorption therein. Exemplary light-sensing devices can have relatively large micron dimensions. As an exemplary application, complementary-metal-oxide-semiconductor photodetectors are formed on a silicon substrate by incorporating an aspect-ratio-trapping technique.
申请公布号 JP5936250(B2) 申请公布日期 2016.06.22
申请号 JP20100066291 申请日期 2010.03.23
申请人 台湾積體電路製造股▲ふん▼有限公司Taiwan Semiconductor Manufacturing Company,Ltd. 发明人 チェン・ジ−イェン;ジェイムズ・ジィ・フィオレンツァ;カルバン・シーン;アンソニー・ジェイ・ロクテフェルド
分类号 H01L31/10;H01L27/144;H01L27/146 主分类号 H01L31/10
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