| 摘要 |
A material analytical sensor (1) includes an emitter (3) that irradiates a material (2) with irradiation light (P) including a wavelength region related to estimation of an amount of a component of the material (2), a controller (6) that controls an irradiation cycle (T1) of the irradiation light (P), a receiver (4) that receives reflected light (P') from the material to output as a pulse signal (PS) and receives disturbance light (NP) to output as a noise signal (NS), an integrator (5) that samples N pulse signals during a predetermined period (T3) and integrates the sampled N pulse signals to obtain a first integrated value (SU1), and samples N noise signals during a same period as the predetermined period with a same cycle as the irradiation cycle and integrates the sampled N noise signals to obtain a second integrated value (SU2), and an extractor (6) that deducts the second integrated value (SU2) from the first integrated value (SU!) to extract an amount of the reflected light. |
