发明名称 VAPOR DEPOSITION MASK, VAPOR DEPOSITION MASK PREPARATION BODY, METHOD FOR PRODUCING VAPOR DEPOSITION MASK, AND METHOD FOR PRODUCING ORGANIC SEMICONDUCTOR ELEMENT
摘要 There are provided a vapor deposition mask capable of satisfying both high definition and lightweight in upsizing and forming a vapor deposition pattern with high definition while securing strength, a method for producing a vapor deposition mask and a vapor deposition mask preparation body capable of simply producing the vapor deposition mask, and furthermore, a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition.;A metal mask 10 in which a plurality of slits 15 are provided and a resin mask 20 are stacked. Openings 25 required for composing a plurality of screens are provided in the resin mask 20. The openings 25 correspond to a pattern to be produced by vapor deposition. Each of the slits 15 is provided at a position of overlapping with an entirety of at least one screen.
申请公布号 US2016168691(A1) 申请公布日期 2016.06.16
申请号 US201414783736 申请日期 2014.03.24
申请人 Dai Nippon Printing Co., Ltd. 发明人 TAKEDA Toshihiko;OBATA Katsunari;OCHIAI Hiromitsu
分类号 C23C16/04 主分类号 C23C16/04
代理机构 代理人
主权项 1. A vapor deposition mask for simultaneously forming vapor deposition patterns for a plurality of screens, comprising: a metal mask in which a plurality of slits are provided; and a resin mask, the metal mask and the resin mask being stacked, wherein openings required for composing the plurality of screens are provided in the resin mask, the openings correspond to a pattern to be produced by vapor deposition, and each of the slits is provided at a position of overlapping with an entirety of at least one screen.
地址 Tokyo JP