发明名称 |
VAPOR DEPOSITION MASK, VAPOR DEPOSITION MASK PREPARATION BODY, METHOD FOR PRODUCING VAPOR DEPOSITION MASK, AND METHOD FOR PRODUCING ORGANIC SEMICONDUCTOR ELEMENT |
摘要 |
There are provided a vapor deposition mask capable of satisfying both high definition and lightweight in upsizing and forming a vapor deposition pattern with high definition while securing strength, a method for producing a vapor deposition mask and a vapor deposition mask preparation body capable of simply producing the vapor deposition mask, and furthermore, a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition.;A metal mask 10 in which a plurality of slits 15 are provided and a resin mask 20 are stacked. Openings 25 required for composing a plurality of screens are provided in the resin mask 20. The openings 25 correspond to a pattern to be produced by vapor deposition. Each of the slits 15 is provided at a position of overlapping with an entirety of at least one screen. |
申请公布号 |
US2016168691(A1) |
申请公布日期 |
2016.06.16 |
申请号 |
US201414783736 |
申请日期 |
2014.03.24 |
申请人 |
Dai Nippon Printing Co., Ltd. |
发明人 |
TAKEDA Toshihiko;OBATA Katsunari;OCHIAI Hiromitsu |
分类号 |
C23C16/04 |
主分类号 |
C23C16/04 |
代理机构 |
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代理人 |
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主权项 |
1. A vapor deposition mask for simultaneously forming vapor deposition patterns for a plurality of screens, comprising:
a metal mask in which a plurality of slits are provided; and a resin mask, the metal mask and the resin mask being stacked, wherein openings required for composing the plurality of screens are provided in the resin mask, the openings correspond to a pattern to be produced by vapor deposition, and each of the slits is provided at a position of overlapping with an entirety of at least one screen. |
地址 |
Tokyo JP |