| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing apparatus capable of simplifying the structure of the apparatus and preventing the deterioration of the plasma generation efficiency.SOLUTION: A plasma processing apparatus 10 includes: a chamber 11; a placement base 12 disposed in the chamber 11 and on which a substrate S is placed; an ICP antenna 13 which is disposed at the exterior of the chamber 11 so as to face the placement base 12 and is connected with a high frequency power source 26; and a window member 14 which is disposed between the placement base 12 and the ICP antenna 13 and is formed by a conductor. The window member 14 is divided into multiple split pieces 27. The multiple split pieces 27 are insulated from each other and connected with each other by a conducting wire 29 and a conducting wire 30 with a capacitor to form a closed circuit 31. |
